Investigation of the Effect of the Short-Term Exposure of Oxygen and Hydrogen Plasma on the Composition and Structure of Thin Tin Dioxide Films

Modern technologies cannot function without the production of thin films tin dioxide, which are most widely used mainly in three areas: as transparent electrodes, catalysts, and solid-state sensors various gases. Their use electrodes is related to high transmittance dioxide layers optical range, well with their low electrical resistivity. The effect short-term exposure plasma on composition structure obtained from a solution pentahydrate tetrachloride 97% ethanol different concentrations ions considered. linear character dependence thickness SnO2 concentration number applied revealed. A decrease resistance found an increase initial layers. It shown that processing hydrogen makes it possible reduce decreasing transparency. oxygen treatment reduces transparency films, increases duration such treatment.